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Hydrogen peroxide

30 %, VLSI Grade
Icon_EVE-EUD Please consider that this product might be liable to some legal sanctions as for example to obtain an end user declaration or the prohibition of some applications. For details please do contact your counterpart in our sales department!
Examples of effect: Damage metals and burn body tissues; may cause serious eye damage. Safety: Avoid contact; wear safety spectacles and gloves. In the event of contact with eyes and skin, rinse with water.
Examples of effect: Lead to damage to heath, cause irritation to eyes, skin or respiratory organs. Are fatal in larger quantities. Safety: As previously stated, in the event of skin irritation or contact with eyes, rinse with water or a suitable medium.
Danger
H302+H332-H318
i harmful if swallowed or if inhaled, causes serious eye damage
P280 P302+P352 P305+P351+P338 P310
i wear protective gloves/protective clothing/eye protection/face protection, IF ON SKIN: Wash with plenty of water, IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing, immediately call a POISON CENTER/doctor
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Empirical formula H2O2
Molar mass (M) 34,02 g/mol
Density (D) 1,11 g/cm³
Boiling point (bp) 107 °C
Melting point (mp) -26 °C
ADR 5.1 II
WGK 1
CAS No. 7722-84-1
EG-Nr. 231-765-0
UN-Nr. 2014

Semiconductor grade

€106.45/Pack Qty. 

excl. VAT. | 2.5 l per Pack Qty.

Art. No. 9790.1

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Hydrogen peroxide
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9790.1 2.5 l plastic

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Downloads / MSDS


General information

Products in VLSI quality

Carl ROTH's VLSI (Very Large Scale Integration) product line offers solvents and acids for cleaning and etching wafers for the semi-conductor industry. Both processes are essential for chip manufacture. Carl ROTH offers a selected range of products.

Properties:

  • High purity
  • Trace metal content usually below 100 ppb
  • Particle-filtered, maximal 250 particles/ml


VLSI or Very Large Scale Integration means that a large number of transistors (now several 100 million) are located on one chip. Since the gaps are very small, roughly 3 μm, the solvents and acids must be of a correspondingly high purity and be particle-filtered. For VLSI, the number of particles is limited to 250 p/ml.


Purity grades for semiconductor manufacturing and research

For the semiconductor industry or research and development in this field, there are different degrees of purity:
VLSI
very large scale integration
Metal ion concentration per foreign element approx. 50-100 ppb, particle concentration <250/ml
ULSI
ultra large scale integration
Metal ion concentration per foreign element approx. 10-50 ppb, particle concentration <100/ml
SLSI
super large scale integration
Metal ion concentration per foreign element approx. 1-10 ppb, particle concentration <30-100/ml


Certificates of Analysis

You can search for and download your certificate of analysis for the selected product here. Please provide your batch number.
The following analysis certificates have been found:

Guarantee analysis

Assay30-31 %
Bead number (≥0,5 µm)≤250 p/ml
Colour (APHA)≤10
Ammonium (NH4)≤0,0001 %
Chloride (Cl)≤0,00005 %
Nitrate (NO3)≤0,0002 %
Phosphate (PO4)≤0,00005 %
Sulphate (SO4)≤0,0001 %
Ash content≤0,0005 %
Acidity (as H2SO4)≤0,002
TOC (Total Organic Carbon)≤0,002 %
Aluminium (Al)≤30 ppb
Antimony (Sb)≤10 ppb
Arsenic (As)≤10 ppb
Barium (Ba)≤10 ppb
Beryllium (Be)≤10 ppb
Bismuth (Bi)≤20 ppb
Lead (Pb)≤10 ppb
Boron (B)≤20 ppb
Cadmium (Cd)≤10 ppb
Calcium (Ca)≤50 ppb
Chromium (Cr)≤10 ppb
Iron (Fe)≤30 ppb
Gallium (Ga)≤10 ppb
Gold (Au)≤20 ppb
Potassium (K)≤20 ppb
Cobalt (Co)≤10 ppb
Copper (Cu)≤10 ppb
Lithium (Li)≤10 ppb
Magnesium (Mg)≤20 ppb
Manganese (Mn)≤10 ppb
Molybdenum (Mo)≤10 ppb
Sodium (Na)≤50 ppb
Nickel (Ni)≤10 ppb
Silver (Ag)≤10 ppb
Strontium (Sr)≤10 ppb
Tantal (Ta)≤20 ppb
Thallium (Tl)≤20 ppb
Titanium (Ti)≤10 ppb
Vanadium (V)≤10 ppb
Zinc (Zn)≤20 ppb
Tin (Sn)≤20 ppb
Zirconium (Zr)≤10 ppb