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ortho-Phosphoric acid

85 %, VLSI Grade
Examples of effect: Damage metals and burn body tissues; may cause serious eye damage. Safety: Avoid contact; wear safety spectacles and gloves. In the event of contact with eyes and skin, rinse with water.
Examples of effect: Lead to damage to heath, cause irritation to eyes, skin or respiratory organs. Are fatal in larger quantities. Safety: As previously stated, in the event of skin irritation or contact with eyes, rinse with water or a suitable medium.
Danger
H290-H302-H314
i may be corrosive to metals, harmful if swallowed, causes severe skin burns and eye damage
P280 P301+P330+P331 P303+P361+P353 P305+P351+P338 P310
i wear protective gloves/protective clothing/eye protection/face protection, IF SWALLOWED: rinse mouth. Do NOT induce vomiting, IF ON SKIN (or hair): Take off immediately all contaminated clothing. Rinse skin with water [or shower], IF IN EYES: Rinse cautiously with water for several minutes. Remove contact lenses, if present and easy to do. Continue rinsing, immediately call a POISON CENTER/doctor
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Orthophosphoric acid
Empirical formula H3PO4
Molar mass (M) 98,00 g/mol
Density (D) 1,71 g/cm³
Boiling point (bp) 158 °C
Melting point (mp) 21 °C
ADR 8 III
WGK 1
CAS No. 7664-38-2
EG-Nr. 231-633-2
UN-Nr. 1805

Semiconductor grade

€181.70/Pack Qty. 

excl. VAT. | 2.5 l per Pack Qty.

Art. No. 9788.1

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Downloads / MSDS


General information

Products in VLSI quality

Carl ROTH's VLSI (Very Large Scale Integration) product line offers solvents and acids for cleaning and etching wafers for the semi-conductor industry. Both processes are essential for chip manufacture. Carl ROTH offers a selected range of products.

Properties:

  • High purity
  • Trace metal content usually below 100 ppb
  • Particle-filtered, maximal 250 particles/ml


VLSI or Very Large Scale Integration means that a large number of transistors (now several 100 million) are located on one chip. Since the gaps are very small, roughly 3 μm, the solvents and acids must be of a correspondingly high purity and be particle-filtered. For VLSI, the number of particles is limited to 250 p/ml.


Purity grades for semiconductor manufacturing and research

For the semiconductor industry or research and development in this field, there are different degrees of purity:
VLSI
very large scale integration
Metal ion concentration per foreign element approx. 50-100 ppb, particle concentration <250/ml
ULSI
ultra large scale integration
Metal ion concentration per foreign element approx. 10-50 ppb, particle concentration <100/ml
SLSI
super large scale integration
Metal ion concentration per foreign element approx. 1-10 ppb, particle concentration <30-100/ml


Certificates of Analysis

You can search for and download your certificate of analysis for the selected product here. Please provide your batch number.
The following analysis certificates have been found:

Guarantee analysis

Assay85-87 %
Bead number (≥0,5 µm)≤250 p/ml
Colour (APHA)≤10
Chloride (Cl)≤0,0001 %
Fluoride (F)≤0,0005 %
Nitrate (NO3)≤0,0001 %
Sulphate (SO4)≤0,0005 %
Insoluble matter≤0,001 %
KMnO4 reducing substancescomplies
Aluminium (Al)≤200 ppb
Antimony (Sb)≤2000 ppb
Arsenic (As)≤200 ppb
Lead (Pb)≤100 ppb
Cadmium (Cd)≤200 ppb
Calcium (Ca)≤300 ppb
Chromium (Cr)≤100 ppb
Iron (Fe)≤1000 ppb
Potassium (K)≤200 ppb
Cobalt (Co)≤300 ppb
Copper (Cu)≤100 ppb
Lithium (Li)≤50 ppb
Magnesium (Mg)≤100 ppb
Manganese (Mn)≤50 ppb
Sodium (Na)≤1000 ppb
Nickel (Ni)≤200 ppb
Strontium (Sr)≤200 ppb
Zinc (Zn)≤1000 ppb